OPTIwet ST75

The OPTIwet ST 75 Wet Process System is designed for single substrate processing. The OPTIwet ST 75 can be utilized for Cleaning, Developing, Lift-off, Etching or Resist Stripping. The optimized process chamber provides excellent process results, repeatability and safe handling of substrates up to 508 x 508 mm (20"x 20").

OPTIwet ST 60

The OPTIwet ST 60 Wet Process System is a new designed tool for single substrate wet process applications, like Cleaning, Developing, Etching or Resist Stripping. The optimized process chamber with interlocked chamber doors provides excellent process results, cleanliness, repeatability and safety operating for substrates up to 400 x 400 mm (16"x 16").

OPTIwet ST 30

The OPTIwet ST30 Wet Process System is a new designed tool for single substrate wet process applications, like cleaning, developing, etching, resist stripping or lift off. The optimized process chamber with interlocked chamber door provides excellent process results, cleanliness and repeatability for substrates up to 12"x 12" or wafers up to 300mm.

OPTIwet SB 30 extended

The OPTIwet SB30 extended (Wet Process Module) is a designed tool for single substrate wet process applications, like cleaning, developing, etching, resist stripping or lift off. The optimized process chamber with interlocked chamber door provides excellent process results, cleanliness and repeatability for substrates up to 12"x 12" or wafers up to 300mm.

OPTIwet SB 30

The OPTIwet SB30 (Wet Process Module is a designed tool for single substrate wet process applications, like cleaning, developing, etching, resist stripping or lift off. The optimized process chamber with interlocked chamber door provides excellent process results, cleanliness and repeatability for substrates up to 9"x 9" or wafers up to 300mm.